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・ Photon mapping
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Photonic curing
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Photonic curing : ウィキペディア英語版
Photonic curing

Photonic curing is the high-temperature thermal processing of a thin film using pulsed light from a flashlamp.〔K. A. Schroder, Technical Proceedings of the 2011 NSTI Nanotechnology Conference and Trade Show, 2, 220-223, 2011.〕 When this transient processing is done on a low-temperature substrate such as plastic or paper, it is possible to attain a significantly higher temperature than the substrate can ordinarily withstand under an equilibrium heating source such as an oven.〔〔 Since the rate of most thermal curing processes (drying, sintering, reacting, annealing, etc.) generally increase exponentially with temperature (i.e. they obey the Arrhenius equation), this process allows materials to be cured much more rapidly (in about 1 millisecond) than with an oven which can take minutes.〔K. A. Schroder, S. C. McCool, W. R. Furlan, Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, 3, 198-201, 2006.〕〔(【引用サイトリンク】title=In flexible electronics, it’s all about protecting the paper )
==Uses==
Photonic curing is used as a thermal processing technique in the manufacturing of printed electronics as it allows the substitution of glass or ceramic substrate materials with inexpensive and flexible substrate materials such as polymers or paper. The effect can be demonstrated with an ordinary camera flash.〔US Pat. #7,820,097.〕 Industrial photonic curing systems are typically water cooled and have controls and features similar to industrial lasers. The pulse rate can be fast enough to allow curing on the fly at speeds beyond 100 m/min making it suitable as a curing process for roll-to-roll processing. Material processing rates can exceed 1 m2/s.〔〔() 〕

抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)
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